TY - JOUR
AU1 - Logue, James
AU2 - Chisholm, Marilynn L.
AB - The fabrication of binary optics using high quality lithographic processes requires binary masks with constant phase contours. Parameter driven software for the development of these masks has been developed at Perkin-Elmer. Applications include zone plates, aspheric lenses, and optics described using Zernike polynomials, arbitrary phase functions, and sampled phase arrays.
TI - General Approaches To Mask Design For Binary Optics
JF - Proceedings of SPIE
DO - 10.1117/12.951482
DA - 1989-05-06
UR - https://www.deepdyve.com/lp/spie/general-approaches-to-mask-design-for-binary-optics-dhY8cfJ5nQ
SP - 19
EP - 24
VL - 1052
IS - 
DP - DeepDyve
ER -