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Magneto-optical analysis of stripe elements embedded in a synthetic antiferromagnet

Magneto-optical analysis of stripe elements embedded in a synthetic antiferromagnet Domain structures and the magnetic reversals of micrometer stripe patterns embedded in a weakly antiferromagnetically exchange coupled Co 90 Fe 10 /Ru/ Co 90 Fe 10 trilayer were investigated. Patterning was achieved by means of ion irradiation through a lithographically defined mask. In this process, irradiated parts become ferromagnetic due to interfacial intermixing. The embedded stripes fabricated by this technique are compared to stripes patterned by reactive ion etching. Using magneto-optical Kerr microscopy, the domain structure and the shape of the magnetic reversal for both kinds of stripes have been studied. Observed differences in the switching behavior are explained by modifications of the magnetic material properties, e.g., anisotropy and saturation magnetization due to the ion irradiation. Irradiated 2-µm-wide stripes show a collective switching with quasidomains during the magnetic reversal. This observation indicates interactions of the internal magnetization of embedded stripes with the adjacent ones in the nonirradiated antiferromagnetically coupled trilayers. Two possible mechanisms suspected to mediate these interactions are discussed: a deviation of the antiparallel magnetic orientation in the synthetic antiferromagnetic material leading to an effective magnetic moment, as well as a domain wall at the boundary of two different kinds of stripes. The latter investigation is supported by micromagnetic simulations. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Physical Review B American Physical Society (APS)

Magneto-optical analysis of stripe elements embedded in a synthetic antiferromagnet

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Publisher
American Physical Society (APS)
Copyright
©2014 American Physical Society
Subject
ARTICLES; Magnetism
ISSN
1098-0121
eISSN
1550-235X
DOI
10.1103/PhysRevB.89.064411
Publisher site
See Article on Publisher Site

Abstract

Domain structures and the magnetic reversals of micrometer stripe patterns embedded in a weakly antiferromagnetically exchange coupled Co 90 Fe 10 /Ru/ Co 90 Fe 10 trilayer were investigated. Patterning was achieved by means of ion irradiation through a lithographically defined mask. In this process, irradiated parts become ferromagnetic due to interfacial intermixing. The embedded stripes fabricated by this technique are compared to stripes patterned by reactive ion etching. Using magneto-optical Kerr microscopy, the domain structure and the shape of the magnetic reversal for both kinds of stripes have been studied. Observed differences in the switching behavior are explained by modifications of the magnetic material properties, e.g., anisotropy and saturation magnetization due to the ion irradiation. Irradiated 2-µm-wide stripes show a collective switching with quasidomains during the magnetic reversal. This observation indicates interactions of the internal magnetization of embedded stripes with the adjacent ones in the nonirradiated antiferromagnetically coupled trilayers. Two possible mechanisms suspected to mediate these interactions are discussed: a deviation of the antiparallel magnetic orientation in the synthetic antiferromagnetic material leading to an effective magnetic moment, as well as a domain wall at the boundary of two different kinds of stripes. The latter investigation is supported by micromagnetic simulations.

Journal

Physical Review B – American Physical Society (APS)

Published: Feb 14, 2014

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