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A Review of: “Handbook of Experimental Methods for Process Improvement” David Drain Chapman & Hall, New York, ISBN 0-412-12701-6

A Review of: “Handbook of Experimental Methods for Process Improvement” David Drain Chapman &... IIE Transactions (1 998) 30, 57 1-579 Book reviews Handbook of Experimental Methods for Process Improvement David Drain Chapman & Hall, New York, ISBN 0-412-12701-6 The author suggests in the preface to this book that this that these designs have, for the most part, satisfied the text is the second member of this series. The first book author's needs in the semiconductor field, wherein his being, Statistical Methods for Industrial Process Control, practical interest lies. which according to the author gives a background on the The chapter on Optimization Methods (for discovering semiconductor industry, and provides statistical under- ideal factor settings) has the Central Composite Design as standing prerequisite to applying the methods in this the main topic. Simplex designs are also demonstrated. second book in the series. This reviewer has not had the The Response Surface and Direction of Steepest Ascent chance to go through the first book. methods are covered in sufficient detail. The reviewer of this book is a practicing engineer. The In the reviewer's opinion, the author succeeds in author has specifically mentioned that this book is in- providing strategic advice, as well as step-by-step in- tended for helping such professionals, with tools for struction http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png IISE Transactions Taylor & Francis

A Review of: “Handbook of Experimental Methods for Process Improvement” David Drain Chapman & Hall, New York, ISBN 0-412-12701-6

IISE Transactions , Volume 30 (6): 1 – Jun 1, 1998

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Publisher
Taylor & Francis
Copyright
Copyright Taylor & Francis Group, LLC
ISSN
1545-8830
eISSN
0740-817X
DOI
10.1080/07408179808966496
Publisher site
See Article on Publisher Site

Abstract

IIE Transactions (1 998) 30, 57 1-579 Book reviews Handbook of Experimental Methods for Process Improvement David Drain Chapman & Hall, New York, ISBN 0-412-12701-6 The author suggests in the preface to this book that this that these designs have, for the most part, satisfied the text is the second member of this series. The first book author's needs in the semiconductor field, wherein his being, Statistical Methods for Industrial Process Control, practical interest lies. which according to the author gives a background on the The chapter on Optimization Methods (for discovering semiconductor industry, and provides statistical under- ideal factor settings) has the Central Composite Design as standing prerequisite to applying the methods in this the main topic. Simplex designs are also demonstrated. second book in the series. This reviewer has not had the The Response Surface and Direction of Steepest Ascent chance to go through the first book. methods are covered in sufficient detail. The reviewer of this book is a practicing engineer. The In the reviewer's opinion, the author succeeds in author has specifically mentioned that this book is in- providing strategic advice, as well as step-by-step in- tended for helping such professionals, with tools for struction

Journal

IISE TransactionsTaylor & Francis

Published: Jun 1, 1998

There are no references for this article.