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An ultimate scaling in the gate width in a carbon nanotube field-effect transistor (CNTFET) isdemonstrated with a gate electrode which is formed by another CNT (width of3 nm) with conventional nanofabrication followed by manipulations with an atomic forcemicroscope (AFM). The transport characteristics of the CNTFET with the CNTgate show marked improvements in device performance compared to one withthe global back gate. This also shows that the AFM-based manipulations canhelp in fabricating prototypes of novel nanoelectronic devices based on CNTs.
Nanotechnology – IOP Publishing
Published: Mar 7, 2007
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