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Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field

Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Applied Physics Letters CrossRef

Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field

Rogers, John A.; Paul, Kateri E.; Jackman, Rebecca J.; Whitesides, George M.
Applied Physics Letters , Volume 70 (20): 2658-2660 – May 19, 1997
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Publisher
CrossRef
ISSN
0003-6951
DOI
10.1063/1.118988
Publisher site
See Article on Publisher Site

Abstract

Journal

Applied Physics Letters – CrossRef

Published: May 19, 1997

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