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Oxide Double‐Layer Nanocrossbar for Ultrahigh‐Density Bipolar Resistive Memory

Oxide Double‐Layer Nanocrossbar for Ultrahigh‐Density Bipolar Resistive Memory A TiO2/VO2 oxide double‐layer nanocrossbar to overcome the sneak path problem in bipolar resistive memory is proposed. TiO2 and VO2 thin films function as a bipolar resistive memory and a bidirectional switch, respectively. The new structure suggests that ultrahigh densities can be achieved with a 2D nanocrossbar array layout. By stacking into a 3D structure, the density can be even higher. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Advanced Materials Wiley

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References (26)

Publisher
Wiley
Copyright
Copyright © 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim
ISSN
0935-9648
eISSN
1521-4095
DOI
10.1002/adma.201102395
pmid
21809400
Publisher site
See Article on Publisher Site

Abstract

A TiO2/VO2 oxide double‐layer nanocrossbar to overcome the sneak path problem in bipolar resistive memory is proposed. TiO2 and VO2 thin films function as a bipolar resistive memory and a bidirectional switch, respectively. The new structure suggests that ultrahigh densities can be achieved with a 2D nanocrossbar array layout. By stacking into a 3D structure, the density can be even higher.

Journal

Advanced MaterialsWiley

Published: Sep 15, 2011

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