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Technological aspects of the preparation of Au-Zn ohmic contacts to p-type InP

Technological aspects of the preparation of Au-Zn ohmic contacts to p-type InP Au-Zn/Au and X/Au-Zn/Y/Au metallizations (where X=Au, Cr or Ni is a nucleation layer and Y=Cr or Ni is a diffusion barrier), formed by vacuum evaporation of Au-Zn (10 wt%) alloy, were studied for the preparation of ohmic contacts to p-type InP. The metallurgical and electrical properties of such contacts were investigated as a function of deposition parameters (especially the deposition rate of Au-Zn alloy) and alloying conditions. The role of the nucleation layer X on the InP surface and of the barrier layer Y between the Au-Zn and the outer Au layer in contact formation is also discussed. http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Semiconductor Science and Technology IOP Publishing

Technological aspects of the preparation of Au-Zn ohmic contacts to p-type InP

Semiconductor Science and Technology , Volume 9 (1) – Jan 1, 1994

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References (8)

Copyright
Copyright © IOP Publishing Ltd
ISSN
0268-1242
eISSN
1361-6641
DOI
10.1088/0268-1242/9/1/009
Publisher site
See Article on Publisher Site

Abstract

Au-Zn/Au and X/Au-Zn/Y/Au metallizations (where X=Au, Cr or Ni is a nucleation layer and Y=Cr or Ni is a diffusion barrier), formed by vacuum evaporation of Au-Zn (10 wt%) alloy, were studied for the preparation of ohmic contacts to p-type InP. The metallurgical and electrical properties of such contacts were investigated as a function of deposition parameters (especially the deposition rate of Au-Zn alloy) and alloying conditions. The role of the nucleation layer X on the InP surface and of the barrier layer Y between the Au-Zn and the outer Au layer in contact formation is also discussed.

Journal

Semiconductor Science and TechnologyIOP Publishing

Published: Jan 1, 1994

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